Estudo de deposição de filmes finos em plasmas de Ar/Ar-H2 em regiões de pós-descarga de catodo oco
Plasma DC hollow cathode has been used for the deposition of thin films by sputtering with release of neutral atoms from the cathode. Hollow-cathode plasma of Ar-H2 currently used in the industry has proven to be more efficient in cleaning surfaces and thin film deposition when compared to argon pla...
সংরক্ষণ করুন:
| প্রধান লেখক: | , , , , , , , |
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| বিন্যাস: | article |
| ভাষা: | pt_BR |
| প্রকাশিত: |
Revista Brasileira de Inovação Tecnologica em Saúde
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| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | https://repositorio.ufrn.br/jspui/handle/123456789/29544 |
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