Submicron fabrication by local anodic oxidation of germanium thin films
Here we describe a lithography scheme based on the local anodic oxidation of germanium film by a scanning atomic force microscope in a humidity-controlled atmosphere. The oxidation kinetics of the Ge film were investigated by a tapping mode, in which a pulsed bias voltage was synchronized and applie...
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| Principais autores: | , , |
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| Formato: | article |
| Idioma: | English |
| Publicado em: |
IOP PUBLISHING
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| Endereço do item: | https://repositorio.ufrn.br/jspui/handle/123456789/28845 |
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