Model of electronic states at the Si-Si02 interface
The electronic properties of the interface between crystalline Si and its amorphous oxide SiO 2 have been studied within the tight-binding approximation by saturating the dangling bonds in three different surfaces (111), (110), and (100) of a semi-infinite Si crystal with SiO2 Bethe lattices. The lo...
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ri-123456789-286762020-05-05T04:27:32Z Model of electronic states at the Si-Si02 interface Carriço, Artur da Silva Barrio, R. A. Elliot, R. J. Model of electronic states The electronic properties of the interface between crystalline Si and its amorphous oxide SiO 2 have been studied within the tight-binding approximation by saturating the dangling bonds in three different surfaces (111), (110), and (100) of a semi-infinite Si crystal with SiO2 Bethe lattices. The localized states due to isolated dangling bonds in the interfaces (Pb centers) are found to be roughly at the same energy, in the Si gap for the (111) and (110) cases, but the (100) interface differs substantially from the other two. It is also found that the value of the site-energy interaction parameter on the Si defect site is important in determining the energy of the defect state. 2020-03-26T20:58:03Z 2020-03-26T20:58:03Z 1986-07-15 article CARRIÇO, Artur da Silva.; ELLIOTT, R. J.; BARRIO, R. A. Model of electronic states at the Si-SiO2 interface. Physical Review B - Condensed Matter and Materials Physics, v. 34, p. 872-878, 1986. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.34.872 Acesso: 26 mar. 2020. 2469-9969 (online), 2469-9950 (print) https://repositorio.ufrn.br/jspui/handle/123456789/28676 https://doi.org/10.1103/PhysRevB.34.872 en application/pdf American Physical Society |
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Model of electronic states |
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Model of electronic states Carriço, Artur da Silva Barrio, R. A. Elliot, R. J. Model of electronic states at the Si-Si02 interface |
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The electronic properties of the interface between crystalline Si and its amorphous oxide SiO 2 have been studied within the tight-binding approximation by saturating the dangling bonds in three different surfaces (111), (110), and (100) of a semi-infinite Si crystal with SiO2 Bethe lattices. The localized states due to isolated dangling bonds in the interfaces (Pb centers) are found to be roughly at the same energy, in the Si gap for the (111) and (110) cases, but the (100) interface differs substantially from the other two. It is also found that the value of the site-energy interaction parameter on the Si defect site is important in determining the energy of the defect state. |
format |
article |
author |
Carriço, Artur da Silva Barrio, R. A. Elliot, R. J. |
author_facet |
Carriço, Artur da Silva Barrio, R. A. Elliot, R. J. |
author_sort |
Carriço, Artur da Silva |
title |
Model of electronic states at the Si-Si02 interface |
title_short |
Model of electronic states at the Si-Si02 interface |
title_full |
Model of electronic states at the Si-Si02 interface |
title_fullStr |
Model of electronic states at the Si-Si02 interface |
title_full_unstemmed |
Model of electronic states at the Si-Si02 interface |
title_sort |
model of electronic states at the si-si02 interface |
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American Physical Society |
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2020 |
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https://repositorio.ufrn.br/jspui/handle/123456789/28676 https://doi.org/10.1103/PhysRevB.34.872 |
work_keys_str_mv |
AT carricoarturdasilva modelofelectronicstatesatthesisi02interface AT barriora modelofelectronicstatesatthesisi02interface AT elliotrj modelofelectronicstatesatthesisi02interface |
_version_ |
1773963517545676800 |