Limpeza a plasma para melhorar a adesão superficial de filmes de óxidos de titânio
Surface modification requires a very clean substrate to increase surface energy and improve adherence of the layer formed on the substrate. Techniques with plasma as the energy source are increasingly being employed. This study used plasma produced in hollow cathode discharge in different atmosphere...
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| Principais autores: | , , , |
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| Formato: | article |
| Idioma: | pt_BR |
| Publicado em: |
Revista Brasileira de Inovação Tecnológica em Saúde
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| Assuntos: | |
| Endereço do item: | https://repositorio.ufrn.br/jspui/handle/123456789/29647 |
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| Resumo: | Surface modification requires a very clean substrate to increase surface energy and improve adherence of the layer formed on the substrate. Techniques with plasma as the energy source are increasingly being employed. This study used plasma produced in hollow cathode discharge in different atmospheres in order to study its influence on depassivation of the titanium surface. Six 10 x10 x 1 mm. Ti plates (grade II) were used. These samples were divided into three groups for plasma cleaning in hollow cathode in an atmosphere of Air, H2
and Air/H2 (50-50%) at a pressure of around 0.7 mbar and temperature of 200°C for 20 and 60 minutes, followed by plasma oxidation at 500°C for 1 hour, with 10% O2 content at a pressure of 2.2 mbar. After oxidation, the samples were assessed by analyzing the contact angle using the sessile drop technique (wettability), x-ray diffraction (XRD) analysis and surface roughness |
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