Nonlinear response of antiferromagnetic films to radiation at oblique incidence

The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The c...

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Principais autores: Carriço, Artur da Silva, Almeida, N. S.
Formato: article
Idioma:English
Publicado em: American Physical Society
Assuntos:
Nonlinear response
Antiferromagnetic films
Radiation
Oblique incidence
Endereço do item:https://repositorio.ufrn.br/jspui/handle/123456789/28854
https://doi.org/10.1103/PhysRevB.48.9835
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spelling ri-123456789-288542020-05-05T04:18:01Z Nonlinear response of antiferromagnetic films to radiation at oblique incidence Carriço, Artur da Silva Almeida, N. S. Nonlinear response Antiferromagnetic films Radiation Oblique incidence The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle. The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle. 2020-04-29T23:17:03Z 2020-04-29T23:17:03Z 1993-10-01 article CARRIÇO, Artur da Silva; ALMEIDA, N. S. Nonlinear response of antiferromagnetic films to radiation at oblique incidence. Physical Review B: Condensed Matter and Materials Physics, [s. l.], v. 48, p. 9, 1993. ISSN 2469-9969 versão online. DOI https://doi.org/10.1103/PhysRevB.48.9835. Disponível em: https://journals.aps.org/prb/abstract/10.1103/PhysRevB.48.9835. Acesso em: 29 abr. 2020. 2469-9969 (online), 2469-9950 (print) https://repositorio.ufrn.br/jspui/handle/123456789/28854 https://doi.org/10.1103/PhysRevB.48.9835 en application/pdf American Physical Society
institution Repositório Institucional
collection RI - UFRN
language English
topic Nonlinear response
Antiferromagnetic films
Radiation
Oblique incidence
spellingShingle Nonlinear response
Antiferromagnetic films
Radiation
Oblique incidence
Carriço, Artur da Silva
Almeida, N. S.
Nonlinear response of antiferromagnetic films to radiation at oblique incidence
description The response of an antiferromagnetic film to incident radiation at oblique incidence is studied in the nonlinear regime. For given values of the frequency and incidence angle, the reflectivity of a film of arbitrary thickness is obtained as an implicit function of the incident field amplitude. The compound effect of the incidence angle and field strength on the reflected radiation is studied by means of the analysis of the reflection coefficient calculated for different values of these external variables. We use the physical parameters of the uniaxial Heisenberg antiferromagnet FeF2 to obtain numerical results. It is found that the threshold for nonlinear optical behavior is strongly dependent on the incidence angle.
format article
author Carriço, Artur da Silva
Almeida, N. S.
author_facet Carriço, Artur da Silva
Almeida, N. S.
author_sort Carriço, Artur da Silva
title Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_short Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_full Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_fullStr Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_full_unstemmed Nonlinear response of antiferromagnetic films to radiation at oblique incidence
title_sort nonlinear response of antiferromagnetic films to radiation at oblique incidence
publisher American Physical Society
publishDate 2020
url https://repositorio.ufrn.br/jspui/handle/123456789/28854
https://doi.org/10.1103/PhysRevB.48.9835
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