Desenvolvimento e caracterização de dispositivos para reposição de filmes finos por descarga em cátodo oco
In the present work we use a plasma jet system with a hollow cathode to deposit thin TiO2 films on silicon substrates as alternative at sol-gel, PECVD, dip-coating e magnetron sputtering techniques. The cylindrical cathode, made from pure titanium, can be negatively polarized between 0 e 1200 V and...
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| フォーマット: | doctoralThesis |
| 言語: | por |
| 出版事項: |
Universidade Federal do Rio Grande do Norte
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| オンライン･アクセス: | https://repositorio.ufrn.br/jspui/handle/123456789/16640 |
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