Desenvolvimento e caracterização de dispositivos para reposição de filmes finos por descarga em cátodo oco

In the present work we use a plasma jet system with a hollow cathode to deposit thin TiO2 films on silicon substrates as alternative at sol-gel, PECVD, dip-coating e magnetron sputtering techniques. The cylindrical cathode, made from pure titanium, can be negatively polarized between 0 e 1200 V and...

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Príomhchruthaitheoir: Araújo, Francisco Odolberto de
Rannpháirtithe: Alves Júnior, Clodomiro
Formáid: doctoralThesis
Teanga:por
Foilsithe / Cruthaithe: Universidade Federal do Rio Grande do Norte
Ábhair:
Filmes finos
Substrato de silício
Cátodo oco
Processo sol-gel
Gaiola ionizante
Films
Silicon substrates
Hollow cathode
Sol-gel process
Ionizing cage
CNPQ::CIENCIAS EXATAS E DA TERRA::FISICA
Rochtain ar líne:https://repositorio.ufrn.br/jspui/handle/123456789/16640
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https://repositorio.ufrn.br/jspui/handle/123456789/16640

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