Influência dos parâmetros de processo na deposição de nitreto de titânio por plasma em gaiola catódica
Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition technique in order to verify the influence of process parameters in optical and structural properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2, setting the Ar and N2 gas flows at 4...
में बचाया:
| मुख्य लेखक: | |
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| अन्य लेखक: | |
| स्वरूप: | Dissertação |
| भाषा: | por |
| प्रकाशित: |
Universidade Federal do Rio Grande do Norte
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| विषय: | |
| ऑनलाइन पहुंच: | https://repositorio.ufrn.br/jspui/handle/123456789/12735 |
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